Imprinting the optical near field of microstructures with nanometer resolution.
نویسندگان
چکیده
Control over the optical near field is a pillar stone of material processing,PI microscopy ,121 and biosensingl :1 1 at the submicrometer scale. The same applies to scanning probe techniques,II AJ which produce an impressive spatial resolution, and to colloidallithographyl' l for casting large periodic nanostructure arrays. However, imaging near-field distributions with subwavelength detail[fi l remains a challenge in this context. Here we demonstrate imaging of complex two-dimensional (20) near-field patterns imprinted on photosensitive films , resulting from interference between laser light and light scattered by dielectric microspheres. We achieve control over the resulting patterns by varying the illuminat ion conditions and the size and arrangement of the particles. Using chalcogenide films l7 l to record the near field, the imprint produces optical,l8] electrical,I'!] and topograph ical I 101 contrast and allows for the writing of erasable features as small as 10 nmJl1] Our technique is directly applicable to any type of scattering particle (size, shape, and material) , thus providing a simple way of imprinting its near field. The optical near field in the vicinity of a microor nanoparticle illuminated by laser light has a spatial distribution that depends on the complex interplay between the properties of the scattering particle, the laser beam, and the substrate. Specifically, the local field en hancement induced by individual particles or sharp tips has been recently identified as a powerful means for nanopatterning applications,11 2. 1J1 opening the possibility to perform subwavelength surface carving of a
منابع مشابه
Near-field nanopatterning Imprinting the Optical Near Field of Microstructures with Nanometer Resolution**
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عنوان ژورنال:
- Small
دوره 5 16 شماره
صفحات -
تاریخ انتشار 2009